These analyses have made it clear that silver halide photography is inherently superior to electronic photography for taking color pictures in general due to its ability to achieve high sensitivity and image quality with reasonable ...
Author: Tadaaki Tani
Publisher: Oxford University Press
Category: Technology & Engineering
Notwithstanding the current excitement surrounding cutting-edge digital imaging techniques, photographic film still provides the highest resolution and most beautiful images of any medium available. For the first time in nearly 20 years, Photographic Sensitivity: Theory and Mechanisms offers a comprehensive, systematic description of the subject, stressing in particular the characteristics of silver halide photography. Topics range from how to prepare silver halide grains and latent image formation to spectral and chemical sensitization to the future of silver halide photography. Based on the author's more than 30 years' experience in the field, Photographic Sensitivity will appeal to a wide range of readers, including students, chemists, and physicists working with silver halide imaging techniques and solid state imaging.
Proceedings of the Symposium on Photographic Sensitivity Held at Gonville and Caius College and Little Hall, Cambridge, September, 1972 R. J. Cox. recording , it is surprising that our present photographic system was discovered so long ...
... the adsorbed silver ion comưlexes and that the silver halide lays a seconiiry role in photographic sensitivity cerely irovijin , silver ions ich can be reluced to metallic silver under the catalytic influence of the latent inare .
From Silver Halide Photography to Plasmonics Tadaaki Tani. 53. 54. 55. 56. 57. 58. 59. 60. 61. 62. 63. 64. ... Tani T. Photographic Science: Advances in Nanoparticles, ... Some aspects of the Mitchell theory of photographic sensitivity.
Author: Tadaaki Tani
Publisher: OUP Oxford
Nanoscience and nanotechnology concern themselves with the research and application of extremely small things and can be used across all scientific fields such as physics, chemistry, biology, material science and engineering. Nanoparticles are of great scientific interest as they provide a bridge between bulk materials and atomic or molecular structures. Interesting and unexpected properties of nanoparticles are largely due to the large surface area of the material. Nanoparticles of noble metals including silver (Ag) attract the interest of many researchers owing to their high potential for plasmonic devices in future. On the other hand, nanoparticles of silver (Ag) and silver halides (AgX) have played central roles and have been extensively studied for many years in silver halide (AgX) photography. Combining knowledge of nanoparticles of Ag and related materials in plasmonics and AgX photography, this book reinforces already existing knowledge, but also presents new ideas for metal nanoparticles in plasmonics. The first part examines the structure and formation of nanoparticles of Ag and related materials. Systematic descriptions of the structure and preparation of Ag, Au, and other noble metal nanoparticles for plasmonics are followed by and related to those of nanoparticles of Ag and AgX in AgX photography. The exploration of the structure and preparation of Ag and AgX nanoparticles in photography incorporates nanoparticles with widely varied sizes, shapes, and structures, and formation processes from nucleation to growth. The second part describes the properties and performances of nanoparticles of Ag and related materials, including chapters on light absorption and scattering, catalysis, photovoltaic effects, and stability. The accumulated knowledge of many years of research in AgX photography is analysed and explained to deepen the reader's knowledge on metal nanoparticles for plasmonics, catalysis, and photovoltaics with new ideas arising from the interaction between them.
In attempting to formulate standard methods for specifying photographic sensitivity , the variation in photographic sensitivity with the time of development has been studied , using the three most common methods of measuring sensitivity ...
Release on 1954 | by Air Force Cambridge Research Laboratories (U.S.). Geophysics Research Directorate
The zero ordinate , corresponding to zero band intensity , is the threshold of sensitivity of the photographic omulsion . The horizontal line under the zero ordinate ( X – X ' ) represents an absolute limit at which no quanta aro ...
Author: Air Force Cambridge Research Laboratories (U.S.). Geophysics Research Directorate
TT - 66-12461 Field 14E PHOTOGRAPHIC SENSITIVITY AND SHARPNESS OF IMAGE . 212 , 21 refs . Order from SLA : $ 2.60 as TT - 66-12453 ... Paper presented at the Conference on High - Speed Photography and Motion Pictures , Moscow , 1960 .
Progress Medal Dr Tadaaki Tani for his contribution to the progresses of our understanding of the mechanism of photographic sensitivity ; particularly through studies of the mechanism of latent image formation , and the mechanism of ...
Vols. for 1853- include the transactions of the Royal Photographic Society of Great Britain.
Jenny , L .: Preparation and Sensitization of Electron - Sensitive Nuclear Track Plates . Photographic Sensitivity , J. W. Mitchell , ed . , Butterworths Scientific Publications ( London ) , 1951 , p . 260 . 84.
Author: George C. Towe
Autoradiography has been used only to a rather limited extent in metallurgical studies. Probably the major deterring factor has been that the autoradiographic systems have not provided the high resolution required in many investigations. A general discussion of the requirements for high-resolution autoradiography is presented in this report including detecting layer as well as radioactive-sample specifications. The need for a thin photographic emulsion in close contact with the metal surface is emphasized. The desirability of using favorable radiation (e.g., low-energy beta radioactivity) is also discussed.
M.T.Kostishin, E.V.Michailovskaya, P.F.Romanenko and G.A.Sandul,About the photographic sensitivity of the thin semiconductor layers", J.Sci.Appl. Photogr.Sinematogr. 10(6), 450-451, (1965). 2. M.T.Kostishin, E.V.Michailovskaya, ...
Author: G.G. Harman
Publisher: Springer Science & Business Media
Category: Technology & Engineering
MICROELECTRONIC INTERCONNECTIONS AND MICROASSEMBL Y WORKSHOP 18-21 May 1996, Prague, Czech Republic Conference Organizers: George Harman, NIST (USA) and Pavel Mach (Czech Republic) Summary of the Technical Program Thirty two presentations were given in eight technical sessions at the Workshop. A list of these sessions and their chairpersons is attached below. The Workshop was devoted to the technical aspects of advanced interconnections and microassembly, but also included papers on the education issues required to prepare students to work in these areas. In addition to new technical developments, several papers presented overviews predicting the future directions of these technologies. The basic issue is that electronic systems will continue to be miniaturized and at the same time performance must continue to improve. Various industry roadmaps were discussed as well as new smaller packaging and interconnection concepts. The newest chip packages are often based on the selection of an appropriate interconnection method. An example is the chip-scale package, which has horizontal (x-y) dimensions,;; 20% larger than the actual silicon chip itself. The chip is often flip-chip connected to a micro ball-grid-array, but direct chip attach was described also. Several papers described advances in the manufacture of such packages.
Strictly peaking , when discussing photographic applications , terms referring to adiant energy evaluated in terms of the wavelength sensitivity of the photoraphic emulsion should be used . This paper is concerned chiefly with ratios of ...
(1) Photographic light sensitivity is due, according to the disorientation theory of Tammann, Steigmann and Sheppard, to disorientation of the ripening nuclei situated on the surface of the silver halide. As the presence of ripening ...
Powell , C. F. , Fowler , P. H. , and Perkins , D. H. , " The Study of Elementary Particles by the Photographic Method , " New York ; Pergamon Press ... Mitchell , J. W. , " Photographic Sensitivity , " Repts . on Prog . in Phys .
JOURNAL OF IMAGING SCIENCE AND TECHNOLOGY® • Volume 48 , Number 3 , May / June 2004 A Review of the Mechanism of Photographic Sensitivity and Roles of Silver Clusters Tadaaki Tania Imaging Material Research Laboratories , Fuji Photo ...
In this range of n, a long diode should be highly sensitive to a change of n. ... The spectral distribution of the photographic sensitivity of the Si:Au system was determined at T= 77 "K and the sensitivity edge was found at 3.5 u.
Release on 1924 | by Franklin Institute (Philadelphia, Pa.)
... THEODORE WILLIAM : Comand E. P. WightMAN : Studies in pressibility , internal pressure and photographic sensitivity , IV . Effect change of atomic volume , i of oxidizers on the sensitivity and River floods , Control of ( Paul ) ...
Author: Franklin Institute (Philadelphia, Pa.)
Vols. 1-69 include more or less complete patent reports of the U. S. Patent Office for years 1825-59. Cf. Index to v. 1-120 of the Journal, p. 
Release on 1961 | by Eastman Kodak Company. Research Laboratories
SENSITIVITY 771.534.1 Methods of Raising the Effective Sensitivity of the Photographic System . K. V. Chibisov . J. Phot . Sci . , 9 : 26-35 , No. 1 , January / February , 1961 . Consideration of the variations in the rate of growth of ...
Author: Eastman Kodak Company. Research Laboratories
SYMPOSIUM The International East - West Symposium on the Factors Influencing Photographic Sensitivity The Role of Photographic Science for the Future of Photography , October 28 - November 2 , 1984 The Maui Surf Hotel , Kaanapali , Maui ...
Sensitive Materials Yoshitada TOMODA Government Chemical Industrial Research Institute , Tokyo Yoshitada TOMODA Special Photographic ... Bibliography sensitized emulsions upon light intensity dependence of photographic sensitivity .